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Silicon Standard Solution
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Standard Silicon Standard 1000ppm in H2O
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Silicon Standard 10000ppm in H2O
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Silicon 0.05% HF (v/v) 100ug/mL
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Silicon 1,000ug/mL in H2O
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Silicon H2O /tr HF 1,000ug/mL
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Silicon H2O 1,000ug/mL
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Silicon H2O /tr HF 1,000ug/mL
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Silicon 0.05% HF (v/v) 1000ug/mL
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Silicon H2O 10000ug/mL
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Silicon H2O /tr HF 10,000ug/mL
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Silicon H2O 10,000ug/mL
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Silicon H2O /tr HF 10,000ug/mL
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Reference Material of Themral Expansivity (Single Crysal of Silicon), 293.15K - 1000K. 60×4.5 x 4.5mm
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Fine Silicon Carbide Powder for Fine Ceramics (beta phase)
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Fine Silicon Nitride Powder for Fine Ceramics (Direct Nitridation) I
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Low Energy Arsenic Implanted Silicon (Level:6×1014 atoms/cm2)
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Single-Crystal of Silicon for Thermal Expansivity Measurements(at Cryogenic Temperature), 10mm×10mm×30mm
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Reference Material of Themral Expansivity (Single Crysal of Silicon), 293.15K - 1000K 60×9×9mm
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Low Energy Arsenic Implanted Silicon
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Fine Silicon Carbide Powder for Fine Ceramics (alpha phase)
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Single-Crystal of Silicon for Specific Heat CapaClty Measurements(at Cryogenic Temperature)
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Fine Silicon Nitride Powder for Fine Ceramics (Direct Nitridation)II
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Silicon Dioxide/Silicon Multilayer Film Reference Material
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Fine Silicon Nitride Powder for Fine Ceramics (Liquid InterfaClal Reaction)
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Single-Crystal of Silicon for Thermal Expansivity Measurements(at Cryogenic Temperature), 10mm×10mm x 60mm